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Anandan, P.
- Simulation of Nanoscale Gate Length with Composite Channel In0.7Ga0.3As/InAs/In0.7Ga0.3As HEMT Using Sentaurus TCAD
Abstract Views :176 |
PDF Views:3
Authors
V. Balavignesh
1,
P. Anandan
2
Affiliations
1 Department of Information and Communication Engineering, S.K.P Engineering College, Thiruvannamalai-606611, IN
2 SKP Engineering College, Tiruvannamalai, Tamil Nadu, IN
1 Department of Information and Communication Engineering, S.K.P Engineering College, Thiruvannamalai-606611, IN
2 SKP Engineering College, Tiruvannamalai, Tamil Nadu, IN
Source
Programmable Device Circuits and Systems, Vol 7, No 4 (2015), Pagination: 127-130Abstract
The aim of this work is to investigate the nanometer-gate In0.7Ga0.3As/InAs/In0.7Ga0.3 As composite-channel high-electron mobility transistors (HEMTs), which are fabricated using platinum buried gate as the Schottky contact metal, were evaluated for RF and logic application. After gate sinking at 250°C, the device exhibited a high gm value at Vd , the current-gain cutoff frequency fT was increased from 390 to 494 GHz, and the gate-delay time was decreased at supply voltage of 0.6 V. This is the highest fT achieved for nm-gate-length HEMT devices. These superior performances are attributed to the reduction of distance between gate and channel and the reduction of parasitic gate capacitances during the gate-sinking process. Moreover, such superior performances were achieved through a very simple and straightforward fabrication process with optimal epistructure of the device.- Analysis & Simulation of InSb HEMT Device for Low Power and Switching Applications
Abstract Views :204 |
PDF Views:2
Authors
V. Arun Kumar
1,
P. Anandan
2
Affiliations
1 Department of Information and Communication Engineering, S.K.P Engineering College, Thiruvannamalai-606611, IN
2 Information and Communication Engineering, SKP Engineering College, Tiruvannamalai, Tamil Nadu, IN
1 Department of Information and Communication Engineering, S.K.P Engineering College, Thiruvannamalai-606611, IN
2 Information and Communication Engineering, SKP Engineering College, Tiruvannamalai, Tamil Nadu, IN
Source
Fuzzy Systems, Vol 7, No 3 (2015), Pagination: 79-81Abstract
The strained band structures of InSb are calculated, and then the DC and RF performances of the InSb HEMTs are analyzed by using the TCAD simulation. These are also compared with the InAs HEMTs. Although the compressive strain applied to the channel increases the electron effective mass m*, the InSb HEMTs still show the higher current drivability and the higher fT than the InAs HEMTs from the lower Vds. However, the severe impact ionization occurs from the lower Vds owing to the smaller impact ionization threshold energy, Eth, although the compressive strain increases it. This restricts the InSb HEMTs within the low Vds applications.
- Image Compression Techniques using Curvelet, Contourlet, Ridgelet and Wavelet Transforms – A Review
Abstract Views :149 |
PDF Views:3
Authors
Affiliations
1 Department of Electronics and Communication Engineering, Sengunthar Engineering College, Tiruchengode-637 205, Tamilnadu, IN
2 Department of Electronics and Communication Engineering, Sona College of Technology, Salem-636 005 Tamilnadu, IN
1 Department of Electronics and Communication Engineering, Sengunthar Engineering College, Tiruchengode-637 205, Tamilnadu, IN
2 Department of Electronics and Communication Engineering, Sona College of Technology, Salem-636 005 Tamilnadu, IN
Source
Biometrics and Bioinformatics, Vol 5, No 7 (2013), Pagination: 267-270Abstract
Image processing holds a very important role in various application fields such as medical, education, surveillance etc. Images are very important documents nowadays; to work with them in some applications they need to be compressed, more or less depending on the purpose of the application. Many different image compression techniques currently exist for the compression of different types of images. Image compression is fundamental to the efficient and cost-effective use of digital imaging technology and applications. An investigation is done on the various types of image compression techniques that exist. This paper deals with study of different available image compression techniques with their performance results.Keywords
Image Compression, Curvelet Transform, Contourlet Transform, Ridgelet Transform, Fractal Transform.- Simulation and Characterisation of HfO2/ALGaN/GaN MOS-HEMT with Source Field Plate for Improved Breakdown Voltage
Abstract Views :191 |
PDF Views:2
Authors
S. Suganya
1,
P. Anandan
2
Affiliations
1 Department of Information and Communication Engineering, S.K.P Engineering College, Tiruvannamalai, IN
2 Information and Communication Engineering, SKP Engineering College, Tiruvannamalai, Tamil Nadu, IN
1 Department of Information and Communication Engineering, S.K.P Engineering College, Tiruvannamalai, IN
2 Information and Communication Engineering, SKP Engineering College, Tiruvannamalai, Tamil Nadu, IN
Source
Automation and Autonomous Systems, Vol 7, No 3 (2015), Pagination: 77-80Abstract
The AlGaN/GaN based HEMTs are the most promising devices for high power and high frequency applications, due to wide band- gap material (3.4 eV of GaN), high density of two-dimensional electron gas (2DEG) in the buried channel, low intrinsic carrier density, and high saturation velocity. From this novel device structure by introducing a source field-plated in the metal oxide Semiconductor high electron mobility transistors (MOS-HEMT) structure having a relatively short gate length and short gate-to-drain distances. The 2D break down analysis is performed using Sentaurus TCAD simulator. The effects of gate to drain distance (Lgd), source field plate length (Lfp) and passivation layer thickness(tp) on break down voltage (BV) is analyzed. The simulations are done using the hydro dynamic (HD) model, which is calibrated/validated with the previously published experimental results. The breakdown voltage is observed to increase with increase in Lf p and tp. Very high breakdown voltage is obtained by optimizing the Lf p to 3 mm and tp to 200 nm at a fixed gate to drain distance of 3.4 mm. The results show a great potential application of the ultra-thin HfO2 source field plated AlGaN/GaN MOS HEMT to deliver high currents and power densities in high power microwave Technologies.- Estimation of Isradipine in Human Plasma by LCMS/MS
Abstract Views :190 |
PDF Views:0
Authors
Affiliations
1 Bioanalytical Laboratories, Lotus Clinical Research Academy Pvt. Ltd., 582, KCA Enclave, Koramangala 8th Block, Bangalore – 560 095, IN
1 Bioanalytical Laboratories, Lotus Clinical Research Academy Pvt. Ltd., 582, KCA Enclave, Koramangala 8th Block, Bangalore – 560 095, IN